Abstract
We use the LOCal oxidation of silicon (LOCOS) method as a fabrication technique to define submicrometer photonic waveguides. We attempted fabricating the wire waveguides with two different masking processes, one with a stack of pad oxide and silicon nitride layers, and the other with a single silicon nitride layer. The smallest waveguide we achieved had a cross-section profile of . The propagation loss of the waveguides was measured by the cut-back method, and the bending loss was measured by employing the serpentine pattern. The minimum propagation loss achieved was and the bending loss was bend for a 5 μm bending radius.
© 2012 Optical Society of America
Full Article | PDF ArticleMore Like This
Boris Desiatov, Ilya Goykhman, and Uriel Levy
Opt. Express 18(18) 18592-18597 (2010)
Guillaume Beaudin, Ali Belarouci, and Vincent Aimez
Opt. Express 23(4) 4377-4384 (2015)
M. Takenaka and Y. Nakano
Opt. Express 15(13) 8422-8427 (2007)