Abstract
A maskless three-dimensional (3D) microfabrication method based on a digital micromirror device (DMD) is proposed for high lateral and vertical resolution. A substrate is scanned laterally under virtual masks of the DMD. The masks are allocated to a large number of virtual slices, all of which are projected in a single scan of the stage. A theoretical model for the cumulative dose distribution in a photoresist is derived and used to predict the resulting 3D profile. Experiments showed that the proposed method is promising for avoiding the stair-step problem and preventing misalignment errors.
© 2011 Optical Society of America
Full Article | PDF ArticleMore Like This
Yong-Sin Syu, Yu-Bin Huang, Ming-Ze Jiang, Chun-Ying Wu, and Yung-Chun Lee
Opt. Express 31(8) 12232-12248 (2023)
Biao Yang, Jinyun Zhou, Qiming Chen, Liang Lei, and Kunhua Wen
Opt. Express 26(22) 28927-28937 (2018)
Min Tang, Zai Chun Chen, Zhi Qiang Huang, Yoo Sang Choo, and Ming Hui Hong
Appl. Opt. 50(35) 6536-6542 (2011)