Abstract
An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.
© 2002 Optical Society of America
Full Article | PDF ArticleMore Like This
Mahesh Pitchumani, Jeremiah Brown, Waleed Mohammed, and Eric G. Johnson
Appl. Opt. 43(8) 1676-1682 (2004)
Jin Won Sung, Heidi Hockel, Jeremiah D. Brown, and Eric G. Johnson
Appl. Opt. 45(1) 33-43 (2006)
Walter Däschner, Pin Long, Robert Stein, Chuck Wu, and S. H. Lee
Appl. Opt. 36(20) 4675-4680 (1997)