Abstract
Diffraction characteristics of N-level (5
≤ N ≤ 8) binary gratings fabricated by repetition of
three sets of photolithography and dry-etching processes have been
investigated. After presentation of the general algorithm to
determine a mask pattern and etching depth combination used in each
fabrication process, all the methods for creating staircase structures
with N = 5, 6, 7, 8 are derived. Then the
diffraction efficiency achievable for the different level numbers, with
the existence of mask alignment errors and for a fixed grating period,
is compared, and it is found that an eight-level structure does not
always give the best value.
© 1998 Optical Society of America
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