Abstract
We have developed a novel method for the selective deposition of thin films on the vertical surface of a planar substrate with a vertical step. This was done with a dual-ion-beam sputtering apparatus that is equipped with two ion-beam sources. Using this technique a multilayer filter was monolithically formed on the vertical surface of a Si substrate on which a photodetector had been fabricated, and clear filtering–photodetecting characteristics were observed. This technique can be applied to the monolithic integration of thin-film devices and waveguide-type optical devices with a vertical end facet.
© 1996 Optical Society of America
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