Abstract
amorphous thin films were fabricated by a pulsed laser deposition technique with the aim of finding photostable layers in as-deposited but preferably in relaxed (annealed) state. Photostability was studied in terms of the films’ stability of refractive index and bandgap under near-bandgap light irradiation. and layers were found to be photostable in both as-deposited as well as relaxed states. Moreover, layers present the lowest surface roughness. These characteristics make pulsed-laser-deposited thin films promising for applications in nonlinear optics.
© 2017 Optical Society of America
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