Abstract
Two-dimensional periodic structures were fabricated upon a fluorine-doped film in which the fluorine content changed gradually in the direction of film thickness. The films were deposited by plasma-enhanced chemical-vapor deposition. The film was periodically patterned into a period and an -groove depth by inductive coupled plasma reactive-ion etching followed by chemical etching in a diluted HF solution. A surface reflectance of 0.7% was attained at wavelength, a value that is one fifth as large as the 3.5% Fresnel reflection of a substrate with a flat surface.
© 2001 Optical Society of America
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