Abstract
The accumulation effects in high-reflectivity (HR) HfO2/SiO2 coatings under
laser irradiation are investigated. The HR HfO2/SiO2 coatings are prepared by
electron beam evaporation at 1 064 nm. The laser-induced damage threshold (LIDT) are
measured at 1 064 nm and at a pulse duration of 12 ns, in 1-on-1 and S-on-1 modes.
Multi-shot LIDT is lower than single-shot LIDT. The laser-induced and native defects
play an important role in the multi-shot mode. A correlative theory model based on
critical conduction band electron density is constructed to elucidate the
experimental phenomena.
© 2011 Chinese Optics Letters
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