Abstract
A linear zone plate named multilayer laue lens (MLL) is fabricated using a
depth-graded multilayer structure. The lens shows considerable potential in focusing
an X-ray beam into a nanometer scale with high efficiency. In this letter, a
depth-graded multilayer consisting of 324 alternating WSi<sub>2</sub> and Si layers
with a total thickness of 7.9 µm is deposited based on the thickness sequence
according to the demands of the zone plate law. Subsequently, the multilayer sample
is sliced and thinned to an ideal depth along the cross-section direction using raw
abrasives and diamond lapping. Finally, the cross-section is polished by a chemical
mechanical polishing (CMP) technique to remove the damages and improve the surface
smoothness. The final depth of the MLL is approximately 7 µm with an achieved aspect
ratio greater than 400. Results of scanning electron microscopy (SEM) and atomic
force microscopy (AFM) indicate that interfaces are sharp, and the multilayer
structure remains undamaged after the thinning and polishing processes. The surface
roughness achieved is 0.33 nm.
© 2012 Chinese Optics Letters
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