Abstract
An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.
© 2002 Optical Society of America
Full Article | PDF ArticleMore Like This
Shuaipeng Yue, Qingyan Hou, Bin Ji, Liang Zhou, Ming Li, Peng Liu, and Guangcai Chang
Appl. Opt. 63(12) 3260-3264 (2024)
Piyali Sarkar, Arup Biswas, Rajnarayan De, K. Divakar Rao, Subir Ghosh, M. H. Modi, Siju John, H. C. Barshilia, Dibyendu Bhattacharyya, and Naba Kishor Sahoo
Appl. Opt. 56(27) 7525-7532 (2017)
Mohammed H. Modi, R. K. Gupta, Amol Singh, and G. S. Lodha
Appl. Opt. 51(16) 3552-3557 (2012)