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Conferences > OFC > 2016 > W2A > W2A.19

2×2 Multimode Interference Coupler with Low Loss Using 248 nm Photolithography

Patrick Dumais, Yuming Wei, Ming Li, Fei Zhao, Xin Tu, Jia Jiang, Dritan Celo, Dominic J. Goodwill, Hongyan Fu, Dongyu Geng, and Eric Bernier

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Abstract

We demonstrate a 2×2 multimode interference coupler in 220 nm silicon photonics, with 3.8 μm by 152 μm footprint. Loss is ≤0.15±0.01 dB for 1530-1565 nm, across the 200 mm wafer using 248 nm lithography. This is the lowest loss reported for sub-micron silicon 2×2 MMI.

© 2016 Optical Society of America

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