216 GBd Plasmonic Ferroelectric Modulator Monolithically Integrated on Silicon Nitride

Manuel Kohli; Daniel Chelladurai; Andreas Messner; Yannik Horst; David Moor; Joel Winiger; Tobias Blatter; Tatiana Buriakova; Clarissa Convertino; Felix Eltes; Michael Zervas; Yuriy Fedoryshyn; Ueli Koch; Juerg Leuthold

European Conference on Optical Communication (ECOC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper Tu4E.5

216 GBd Plasmonic Ferroelectric Modulator Monolithically Integrated on Silicon Nitride

Manuel Kohli, Daniel Chelladurai, Andreas Messner, Yannik Horst, David Moor, Joel Winiger, Tobias Blatter, Tatiana Buriakova, Clarissa Convertino, Felix Eltes, Michael Zervas, Yuriy Fedoryshyn, Ueli Koch, and Juerg Leuthold

European Conference and Exhibition on Optical Communication 2022

Basel Switzerland
18–22 September 2022
ISBN: 978-1-957171-15-9

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Advanced Modulators (Tu4E)

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M. Kohli, D. Chelladurai, A. Messner, Y. Horst, D. Moor, J. Winiger, T. Blatter, T. Buriakova, C. Convertino, F. Eltes, M. Zervas, Y. Fedoryshyn, U. Koch, and J. Leuthold, "216 GBd Plasmonic Ferroelectric Modulator Monolithically Integrated on Silicon Nitride," in European Conference on Optical Communication (ECOC) 2022, J. Leuthold, C. Harder, B. Offrein, and H. Limberger, eds., Technical Digest Series (Optica Publishing Group, 2022), paper Tu4E.5.

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Abstract

We demonstrate a 216 GBd plasmonic ferroelectric modulator monolithically integrated with a foundry-produced silicon nitride platform. The combination of low-loss waveguiding, nanoscale plasmonics, and strong Pockels coefficients in barium titanate offers a platform for next-generation optical interconnect systems.

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