Abstract
We report a large-area metasurface beam shaper via 12-inch immersion lithography CMOS platform. A3 × 3 mm2 metasurface beam shaper is designed to transfer a Gaussian intensity distribution to a Top-Hat intensity distribution.
© 2020 The Author(s)
PDF ArticleMore Like This
Qize Zhong, Yuan Dong, Dongdong Li, Nanxi Li, Ting Hu, Zhengji Xu, Yanyan Zhou, Keng Heng Lai, Yuan Hsing Fu, Vladimir Bliznetsov, Hou-Jang Lee, Wei Loong Loh, Shiyang Zhu, Qunying Lin, and Navab Singh
Th2A.8 Optical Fiber Communication Conference (OFC) 2020
Nanxi Li, Yuan Hsing Fu, Yuan Dong, Ting Hu, Zhengji Xu, Qize Zhong, Dongdong Li, Yanyan Zhou, Keng Heng Lai, Vladimir Bliznetsov, Hou-Jang Lee, Wei Loong Loh, Shiyang Zhu, Qunying Lin, and Navab Singh
W2A.9 Optical Fiber Communication Conference (OFC) 2020
Yuan Hsing Fu, Nanxi Li, Qize Zhong, Yuan Dong, Ting Hu, Dongdong Li, Zhengji Xu, Yanyan Zhou, Keng Heng Lai, Vladimir Bliznetsov, Hou-Jang Lee, Wei Loong Loh, Shiyang Zhu, Qunying Lin, and Navab Singh
SF2R.7 CLEO: Science and Innovations (CLEO:S&I) 2020