Large Area Tunable Alvarez Metalens via Stepper Photolithography

Shane Colburn; Alan Zhan; Arka Majumdar; Arka Majumdar

doi:10.1364/CLEO_SI.2018.SF1J.4

Conference on Lasers and Electro-Optics
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper SF1J.4
•https://doi.org/10.1364/CLEO_SI.2018.SF1J.4

Large Area Tunable Alvarez Metalens via Stepper Photolithography

Shane Colburn, Alan Zhan, and Arka Majumdar

CLEO: Science and Innovations 2018

San Jose, California United States
13–18 May 2018
ISBN: 978-1-943580-42-2

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Metasurfaces (SF1J)

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S. Colburn, A. Zhan, and A. Majumdar, "Large Area Tunable Alvarez Metalens via Stepper Photolithography," in Conference on Lasers and Electro-Optics, OSA Technical Digest (online) (Optica Publishing Group, 2018), paper SF1J.4.

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Abstract

Using inexpensive and high-throughput stepper lithography, we design and fabricate 1 cm wide tunable metalenses which exhibit a focal length change of 162%, more than 6 cm, with only 2.4 mm lateral actuation.

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