Abstract
Femtosecond (fs) laser micromachining and pulse shaping are considered solid topics of research among the scientific community. Recently, effort has been made in order to incorporate the ability of shaping the temporal signature of a fs-pulse aiming to fully take advantage of the micromachining process [1]. As it is well known, silicon presents a sharp Raman peak centred at 521 cm−1, which corresponds to a vibrational motion that has an oscillation period of 64 fs. In this work, we study silicon surface micromachined by fs shaped pulses, consisting of pulse trains and demonstrate it effect on the structuring process.
© 2015 IEEE
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