Status and Potential of Laser based EUV Sources

Akira Endo

doi:10.1364/CLEO_AT.2015.ATu4M.5

CLEO: 2015
OSA Technical Digest (online) (Optica Publishing Group, 2015),
paper ATu4M.5
•https://doi.org/10.1364/CLEO_AT.2015.ATu4M.5

Status and Potential of Laser based EUV Sources

Akira Endo

CLEO: Applications and Technology 2015

San Jose, California United States
10–15 May 2015
ISBN: 978-1-55752-968-8

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Novel Sources for Industrial Applications (ATu4M)

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A. Endo, "Status and Potential of Laser based EUV Sources," in CLEO: 2015, OSA Technical Digest (online) (Optica Publishing Group, 2015), paper ATu4M.5.

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Abstract

The established EUV source for lithography is driven by a high average power pulsed CO₂ laser. Micro droplet of Tin is injected as the plasma source. Present average power is more than 100W, and the scaling potential to over kW is described regarding several physical limits.

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