Abstract
We demonstrate the photosensitivity of an extremely high index contrast silicon oxynitride waveguide using an arrayed-waveguide grating multi/demultiplexer. We observed a large index change for a 7.7%-Δ waveguide induced by ArF laser irradiation, which was up to 2.4 × 10−3 and stable for thermal annealing.
© 2010 Optical Society of America
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