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Infrared micropolarizer array fabricated using a reversal nanoimprint

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Abstract

Using a reversal nanoimprint and metal evaporation process, we fabricated a micropolarizer array for the 2.5–7 μm wavelength region. The micropolarizer array has a unique unit, which is composed of 2×3 arrays on an intrinsic silicon substrate. Each array consists of a 200 nm period bilayer Al grating in a 1.3mm×1.3mm aperture. The transmittance of transverse magnetic polarization of each array is greater than 65% in the 2.5–7 μm wavelength range, and the extinction ratio is over 35 dB in the 3–4 μm and 6–7 μm wavelength range. This fabricated micropolarizer array has lower costs and better compatibility with microfabrication processes.

© 2018 Optical Society of America

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