Abstract
We report the results of extreme-ultraviolet reflectance measurements and structural characterization of multilayer mirrors made by sequential sputter deposition of Si and B4C. Compared with Si/Mo multilayers, Si/B4C have a much narrower bandpass (δλ) and better off-peak rejection but lower peak reflectance (R0). Mirrors with three different designs gave the following results: R0 = 0.275 and δλ = 0.31 nm at 13.1 nm and normal incidence; R0 = 0.34 and δλ = 1.1 nm at 18.2 nm and 45°; and R0 = 0.30 and δλ= 2.0 nm at 23.6 nm and 45°. These multilayers exhibited excellent stability on annealing at temperatures up to 600°C.
© 1994 Optical Society of America
Full Article | PDF ArticleMore Like This
Hisayuki Okada, Kou Mayama, Yoshinori Goto, Isao Kusunoki, and Mihiro Yanagihara
Appl. Opt. 33(19) 4219-4224 (1994)
Benjawan Kjornrattanawanich, Saša Bajt, and John F. Seely
Appl. Opt. 43(5) 1082-1090 (2004)
Hirohisa Hara, Shin’ichi Nagata, Ryouhei Kano, Kazuyoshi Kumagai, Taro Sakao, Toshifumi Shimizu, Saku Tsuneta, Tsuyoshi Yoshida, Wakana Ishiyama, Tetsuya Oshino, and Katsuhiko Murakami
Appl. Opt. 38(31) 6617-6627 (1999)