Characterization of electro-optic polymer films by use of decal-deposited reflection Fabry–Perot microcavities

Ph. Prêtre; L.-M. Wu; R. A. Hill; A. Knoesen

doi:10.1364/JOSAB.15.000379

Journal of the Optical Society of America B
Vol. 15,
Issue 1,
pp. 379-392
(1998)
•https://doi.org/10.1364/JOSAB.15.000379

Characterization of electro-optic polymer films by use of decal-deposited reflection Fabry–Perot microcavities

Ph. Prêtre, L.-M. Wu, R. A. Hill, and A. Knoesen

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
Ph. Prêtre, L.-M. Wu, R. A. Hill, and A. Knoesen, "Characterization of electro-optic polymer films by use of decal-deposited reflection Fabry–Perot microcavities," J. Opt. Soc. Am. B 15, 379-392 (1998)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

We have used resonant reflection mode Fabry–Perot microcavities (RFPM’s) to determine linear optical and electro-optical properties of poled nonlinear optical polymers (NLP’s). Measured reflectances from angular scans of RFPM’s have been analyzed with an electromagnetic plane-wave multilayer analysis that took into account the anisotropic nature of the NLP layer. We have numerically investigated the mutual dependence of refractive indices and layer thickness and the accuracy of the results obtained. As an illustration of this characterization technique, the refractive indices of a 10 mol. % Disperse Red 1/poly(methyl methacrylate) side-chain NLP have been determined to within $\pm 0.005,$ the NLP layer thicknesses to within 1%, and electro-optic coefficients to within 5%. We optimized RFPM structures for measurements at the wavelength $λ = 430 nm$ by changing the electrode metal from gold to aluminum. Using a guest–host NLP, 5 wt. % diphenyl-tricyanovinyl-aniline in poly(methyl methacrylate), we show that the method is capable of measuring electrorefraction and electroabsorption as well as a converse piezoelectric contribution. We show that a NLP decal deposition technique is particularly well suited to fabrication of these RFPM’s.

Full Article | PDF Article

More Like This

Electro-optic characterization of nonlinear-optical guest–host films and polymers

G. Khanarian, J. Sounik, D. Allen, S. F. Shu, C. Walton, H. Goldberg, and J. B. Stamatoff
J. Opt. Soc. Am. B 13(9) 1927-1934 (1996)

Polymer in-line fiber modulators for broadband radio-frequency optical links

S. A. Hamilton, D. R. Yankelevich, A. Knoesen, R. T. Weverka, R. A. Hill, and G. C. Bjorklund
J. Opt. Soc. Am. B 15(2) 740-750 (1998)

Improved attenuated-total-reflection technique for measuring the electro-optic coefficients of nonlinear optical polymers

Yi Jiang, Zhuangqi Cao, Qishun Shen, Xiaoming Dou, Yingli Chen, and Yukihiro Ozaki
J. Opt. Soc. Am. B 17(5) 805-808 (2000)

Previous Article Next Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (18)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (13)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Metal	$n + ik$		Sample-Preparation Conditions
Metal	At $λ = 633 nm$	At $λ = 430 nm$	Sample-Preparation Conditions
Gold	$0.167 + i 3.075$	$1.324 + i 1.762$	$d = 150 nm$ upon glass with a 1-nm Ti adhesion layer; electron beam evaporation; deposition rate 1 nm/s
	$0.374 + i 2.962$	$1.714 + i 1.680$	$d = 10 nm$ upon silicon; electron beam evaporation; deposition rate 0.1 nm/s
	$0.180 + i 2.993$	$1.611 + i 1.935$	As in Ref. 23; spline interpolation
Aluminum	$0.860 + i 5.439$	$0.381 + i 3.670$	$d = 100 nm$ upon glass; electron beam evaporation; deposition rate, 1 nm/s
	$0.959 + i 5.660$	$0.393 + i 3.794$	$d = 100 nm$ upon glass; electron beam evaporation; deposition rate 0.1 nm/s
	$1.319 + i 6.006$	$0.665 + i 4.164$	$d = 20 nm$ upon silicon; electron beam evaporation; deposition rate 0.1 nm/s
	$1.374 + i 7.620$	$0.564 + i 5.230$	As in Ref. 23; spline interpolation

Parameter	Intrinsic Accuracy		Extrinsic Accuracy $(2.5 \leq k_{Au} \leq 6.5)$ ^a
Parameter	$k_{Au} = 4.5,$ $σ_{min} = 1.2 \times 10^{- 2},$ 95% Confidence Interval	$k_{Au} = 4.5,$ $σ_{min} = 3 \times 10^{- 2},$ 95% Confidence Interval	Extrinsic Accuracy $(2.5 \leq k_{Au} \leq 6.5)$ ^a
$n_{Au}$	0.33 ± 0.01		0.3 ± 0.1
$d_{Au}$ (nm)	25.1 ± 0.7		(3 ± 2) $\times 10$
$n_{O},$ NLP	1.5905 ± 0.0005		1.5907 ± 0.0004
$k_{O},$ NLP	(1.70 ± 0.07) $\times 10^{- 3}$		(1.7 ± 0.1) $\times 10^{- 3}$
$n_{E},$ NLP	1.6288 ± 0.0003		1.627 ± 0.005
$k_{E},$ NLP	(2.1 ± 0.3) $\times 10^{- 3}$		(2.0 ± 0.3) $\times 10^{- 3}$
$d_{NLP}$ (μm)	3.438 ± 0.005		3.44 ± 0.02
$r_{13}$ (pm/V)		4.3 ± 0.2	4.2 ± 0.2
$r_{33}$ (pm/V)		21.1 ± 0.6	20.9 ± 0.8

$λ = 430 nm$	Modeling
$λ = 430 nm$	Al Electrodes	Au Electrodes ^a
$n + ik,$ metal layers	$0.564 + i 5.230$ ^b	$1.611 + i 1.935$ ^b
$d$ (nm), top metal layer	10	30
$n_{O} + {ik}_{O},$ NLP	$1.500 + i 3.731 \times 10^{- 3}$ ^c	$1.500 + i 3.731 \times 10^{- 3}$ ^c
$n_{E} + {ik}_{E},$ NLP	$1.500 + i 3.731 \times 10^{- 3}$ ^c	$1.500 + i 3.731 \times 10^{- 3}$ ^c
$d$ (nm), NLP	3600	3600
$V_{\mod}$ (V)	15	15
$d_{33}$ (pm/V), NLP	0	0
$r_{13}$ (pm/V), NLP	0.5	0.5
$r_{33}$ (pm/V), NLP	2.5	2.5

	Measurements
$λ = 430 nm$	Al Electrodes ( $σ_{min} = 1.8 \times 10^{- 2},$ 95% Confidence Interval)	Au Electrodes ^a ( $σ_{min} = 2.9 \times 10^{- 3},$ 95% Confidence Interval)
$n + ik,$ metal layers	$(0.6 \pm 0.2) + i 3.670$ ^b	$(1.5 \pm 0.1) + i 1.762$ ^b
$d$ (nm), top metal layer	17 ± 1	35 ± 2
$n_{O},$ NLP	1.5073 ± 0.0007	1.5060 ± 0.0002
$k_{O},$ NLP	(3.4 ± 0.4) $\times 10^{- 3}$	(3.3 ± 0.1) $\times 10^{- 3}$
$n_{E},$ NLP	1.5016 ± 0.0004	1.5018 ± 0.0001
$k_{E},$ NLP	(4.0 ± 0.4) $\times 10^{- 3}$	(3.8 ± 0.1) $\times 10^{- 3}$
$d$ (μm), NLP	3.713 ± 0.005	3.531 ± 0.003
$V_{\mod}$ (V)	15	15
$d_{33}$ (pm/V), NLP	$- 0.79$ ± 0.05	$- 0.61$ ± 0.03
$r_{13}$ (pm/V), NLP	$- 0.46$ ± 0.05	$- 0.56$ ± 0.04
$s_{13}$ (pm/V), NLP	0.244 ± 0.009	0.43 ± 0.01
$r_{33}$ (pm/V), NLP	$- 1.00$ ± 0.03	$- 1.39$ ± 0.03
$s_{33}$ (pm/V), NLP	0.86 ± 0.03	1.55 ± 0.04

Parameter	Best-Fit Mode	Next Higher Mode	Next Lower Mode
$n_{O, NLP}$	1.5905	1.6315	1.5484
$k_{O, NLP}$	$1.70 \times 10^{- 3}$	$1.66 \times 10^{- 3}$	$1.74 \times 10^{- 3}$
$n_{E, NLP}$	1.6288	1.6712	1.5851
$k_{E, NLP}$	$2.1 \times 10^{- 3}$	$2.1 \times 10^{- 3}$	$2.4 \times 10^{- 3}$
$d_{NLP}$ (nm)	3438	3545	3330
$χ^{2}$ $(σ = 1)$	0.08	0.11	0.13
$r_{33}$ (pm/V)	21.1	19.8	20.7

Abstract

Cited By

Figures (18)

Tables (5)

Equations (13)

Journal of the Optical Society of America B