Abstract

Numerical simulations have been performed to study the influence of resist-developing errors on continuous-relief microlenses. For very low Fresnel numbers $(N<4),$ the focal shift counteracts changes in the radius of curvature that are due to the depth errors and stabilizes the focal length. For higher Fresnel numbers $(N>2),$ the focal length is essentially determined by the diffraction at the lateral pattern of the segments, and deviations from the ideal blaze influence only the efficiency. A qualitative picture based on Fourier optics is given to explain these markedly relaxed tolerances with respect to depth errors for planar optical elements and even for low Fresnel numbers.

© 1997 Optical Society of America

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