Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Analysis of double-exposure speckle photography with two-beam illumination

Not Accessible

Your library or personal account may give you access

Abstract

Speckle photography offers a technique for measuring small strains on an object in the presence of large displacements. An analysis is presented of this technique, which accounts for the phenomena observed and predicts its capabilities and limitations. The analysis is sufficiently general to describe either of two related techniques, one that permits measurement of strains in the absence of large displacements and one that permits measurement of large displacements alone.

© 1974 Optical Society of America

Full Article  |  PDF Article
More Like This
Measurement of size and concentration of scattering particles by speckle photography

O. F. Genceli, J. B. Schemm, and C. M. Vest
J. Opt. Soc. Am. 70(10) 1212-1218 (1980)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (4)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (27)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved