Abstract

We present a replication process, named reversal soft ultraviolet (UV) nanoimprint, to fabricate a high-aspect-ratio flexible subwavelength grating (SWG) on a polyurethane acrylate (PUA). This nanopatterning technique consists of casting, reversal UV imprint, and dry release. The UV curing process of PUA to avoid pattern collapse is investigated. Revalpha film acts as the supporting and sacrificial layer during the whole process due to its special surface energy property. The free-standing PUA structures with a period of 200 nm and a depth of 350 nm can be automatically released from the Revalpha film by heating. The PUA resist is well suited to replicate fine patterns of the mold with high aspect ratio and large area precisely and uniformly for low surface energy and low viscosity. The measured transmittance is compared with the calculation results based on rigorous coupled-wave analysis in the wavelength region ranging from 500 to 800 nm. The experimental results agree well with the theoretical calculations.

© 2012 Chinese Optics Letters

Fabrication of antireflection subwavelength gratings at the tips of optical fibers using UV nanoimprint lithography

Yoshiaki Kanamori, Masaaki Okochi, and Kazuhiro Hane
Opt. Express 21(1) 322-328 (2013)

Low-cost fabrication of large area sub-wavelength anti-reflective structures on polymer film using a soft PUA mold

Jie Zhang, Su Shen, Xiao X Dong, and Lin S Chen
Opt. Express 22(2) 1842-1851 (2014)

Infrared micropolarizer array fabricated using a reversal nanoimprint

Xiangwei Zeng, Jinkui Chu, Weidong Kang, and Ran Zhang
Appl. Opt. 57(7) 1530-1533 (2018)

Transmittance enhancement of sapphires with antireflective subwavelength grating patterned UV polymer surface structures by soft lithography

Soo Hyun Lee, Jung Woo Leem, and Jae Su Yu
Opt. Express 21(24) 29298-29303 (2013)

Study of moiré grating fabrication on metal samples using nanoimprint lithography

Minjin Tang, Huimin Xie, Jianguo Zhu, Xiaojun Li, and Yanjie Li
Opt. Express 20(3) 2942-2955 (2012)