Abstract

We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions are shown to agree well with experiments.

© 2001 Optical Society of America

Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin-Seung Sohn, Myung-Bok Lee, Wan-Chin Kim, Eun-Hyung Cho, Tae-Wan Kim, Chan-Young Yoon, No-Cheol Park, and Young-Pil Park
Appl. Opt. 44(4) 506-511 (2005)

Gray-scale masks for diffractive-optics fabrication: I. Commercial slide imagers

Thomas J. Suleski and Donald C. O’Shea
Appl. Opt. 34(32) 7507-7517 (1995)

Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

Walter Däschner, Pin Long, Robert Stein, Chuck Wu, and S. H. Lee
Appl. Opt. 36(20) 4675-4680 (1997)

Additive lithography for fabrication of diffractive optics

Mahesh Pitchumani, Heidi Hockel, Waleed Mohammed, and Eric G. Johnson
Appl. Opt. 41(29) 6176-6181 (2002)

Gray-scale masks for diffractive-optics fabrication: II. Spatially filtered halftone screens

Donald C. O’Shea and Willie S. Rockward
Appl. Opt. 34(32) 7518-7526 (1995)