Abstract
In fabricating a diffractive optical element the ratio of the
etching depth between the (n - 1)th and the
nth mask is usually 1/2. We found that the diffraction
efficiency of a diffractive optical element can be improved by as much
as 7.8% if the above ratio (1/2) is not kept constant. For
achieving this improvement the difference between the desired and the
actual diffraction pattern is also used as an objective function for
phase quantization.
© 2001 Optical Society of America
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