Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Correction masks for thickness uniformity in large-area thin films

Not Accessible

Your library or personal account may give you access

Abstract

Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.

© 2000 Optical Society of America

Full Article  |  PDF Article
More Like This
Emission pattern of real vapor sources in high vacuum: an overview

Francisco Villa and Octavio Pompa
Appl. Opt. 38(4) 695-703 (1999)

Optimization of thickness uniformity of optical coatings on a conical substrate in a planetary rotation system

Chun Guo, Mingdong Kong, Cunding Liu, and Bincheng Li
Appl. Opt. 52(4) B26-B32 (2013)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (24)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (25)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved