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High-rate automated deposition system for the manufacture of complex multilayer coatings

Brian T. Sullivan, Glenn A. Clarke, Takayuki Akiyama, Norman Osborne, Martial Ranger, J. A. Dobrowolski, Louisa Howe, Akira Matsumoto, Yizhou Song, and Kazuo Kikuchi

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Abstract

A previously described automated thin-film deposition system based on rf-magnetron sputtering could deposit quite complex optical multilayer systems with good precision and with no one in attendance [Sullivan and Dobrowolski, Appl. Opt. 32, 2351–2360 (1993)]. However, the deposition rate was slow, and the uniform area on the substrate was limited. We describe an ac-magnetron sputtering process in which the same deposition accuracy has been combined with significantly better film uniformity and a fivefold or sevenfold increase in the deposition rate. This makes the equipment of commercial interest. Experimental results are presented for several difficult coating problems.

© 2000 Optical Society of America

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