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Very-large-scale-integration fabrication technique for binary-phase gratings on sapphire

Andrew J. Stevens, William J. Hossack, and Sergei Samus

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Abstract

An efficient, high-yield process for the production of binary-phase holograms is presented by controlled deposition of silicon nitride over a sapphire substrate with the binary structure formed by plasma etch of the silicon nitride. Optical results are presented for a 16 × 16 transmission fanout element that shows near-optimal performance.

© 1995 Optical Society of America

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