Abstract

Current pattern data formats for electron beam lithography are specifically designed to meet the needs of the VLSI industry. As a result, pattern data file size is often the limiting factor in the production of a binary computer generated hologram and not the spatial bandwidth product. This paper explores one alternate pattern data format that facilitates the full utilization of the e-beam machine’s spatial bandwidth product without introducing prohibitive amounts of pattern data. The pattern data format uses two well-established data compression techniques specifically tailored to remove the redundancies present in holographic fringe patterns.

© 1990 Optical Society of America

Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography

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Binary computer-generated holograms

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