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Ion beam processing for coating MgF2 onto ambient temperature substrates

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Abstract

In this paper, we report on the use of inert gas ion bombardment during the deposition of MgF2 films on ambient temperature substrates. The low energy (<250-eV/ion) bombardment is shown to increase significantly the abrasion resistance and adherence of the films without significantly degrading their optical performance. The success of this technique has wide-ranging implications for the application of durable coatings to temperature sensitive substrates.

© 1984 Optical Society of America

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