Abstract

We measured the refractive index of layers of hafnium dioxide that were prepared by evaporation in a vacuum. It is transparent to wavelengths as short as 230 nm. Its refractive index at 300 nm was as high as 2.10 or as low as 1.90, depending upon the conditions of evaporation. Tests at Los Alamos Scientific Laboratory indicate that its laser damage threshold is approximately 2 J/cm² at a wavelength of 355 nm. Multilayer dielectric mirrors were prepared using hafnium dioxide and silicon dioxide. The radiant reflectance exceeded 99% at a wavelength of 320 nm.

© 1977 Optical Society of America

Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases

O. Stenzel, S. Wilbrandt, S. Yulin, N. Kaiser, M. Held, A. Tünnermann, J. Biskupek, and U. Kaiser
Opt. Mater. Express 1(2) 278-292 (2011)

Effects of substrate temperatures on the structure and properties of hafnium dioxide films

Hongfei Jiao, Xinbin Cheng, Jiangtao Lu, Ganghua Bao, Yongli Liu, Bin Ma, Pengfei He, and Zhanshan Wang
Appl. Opt. 50(9) C309-C315 (2011)

Loss mechanisms in dielectric optical interference devices

Oded Arnon
Appl. Opt. 16(8) 2147-2151 (1977)

Correlation between properties of HfO₂ films and preparing parameters by ion beam sputtering deposition

Huasong Liu, Yugang Jiang, Lishuan Wang, Jian Leng, Peng Sun, Kewen Zhuang, Yiqin Ji, Xinbin Cheng, Hongfei Jiao, Zhanshan Wang, and Bingjun Wu
Appl. Opt. 53(4) A405-A411 (2014)

A simple method for calculating the optical properties of multilayer-dielectric reflectors*

M. Sparks
J. Opt. Soc. Am. 67(11) 1590-1594 (1977)