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Effective third-order nonlinearities in metallic refractory titanium nitride thin films: publisher’s note

Nathaniel Kinsey, Akbar Ali Syed, Devon Courtwright, Clayton DeVault, Carl E. Bonner, Vladimir I. Gavrilenko, Vladimir M. Shalaev, David J. Hagan, Eric W. Van Stryland, and Alexandra Boltasseva

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Abstract

This publisher’s note amends the Acknowledgments of [Opt. Mater. Express 5, 2395 (2015)].

© 2015 Optical Society of America

This article was originally published with incomplete funding information [1]. The article was corrected on 14 October 2015 and the correct Acknowledgements appear below:

Acknowledgments

The authors appreciate helpful discussions and manuscript revisions from Prof. M. Noginov (Norfolk State University), Prof. M. Ferrera (Purdue University/Heriot-Watt University), and Dr. A. Lagutchev (Purdue University). This work is supported by ARO grant 57981-PHW911NF-11-1-0359, ARO MURI grant 56154-PH-MUR (W911NF-09-1-0539), National Science Foundation (NSF) PREM DRM-1205457, National Science Foundation (NSF) NCN EEC-0228390, Air Force Office of Scientific Research (AFOSR) grant FA9550-09-1-0456. EWVS and DJH wish to acknowledge support under National Science Foundation (NSF) grants ECCS-1202471 and ECCS-1229563.

References and links

1. N. Kinsey, A. Syed, D. Courtwright, C. DeVault, C. Bonner, V. Gavrilenko, V. Shalaev, D. Hagan, E. Van Stryland, and A. Boltasseva, “Effective third-order nonlinearities in metallic refractory titanium nitride thin films,” Opt. Mater. Express 5(11), 2395–2403 (2015). [CrossRef]  

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