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Conferences > QELS > 2005 > JThG > JThG2
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2005),
  • paper JThG2

Efficient 13.5 nm EUV generation from a laser plasma

M. Richardson, C-S Koay, K Takenoshita, S. George, R. Bernath, M.M. Al-Rabban, and V. Bakshi

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Abstract

We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication.

© 2005 Optical Society of America

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