Abstract
We present a comparative study of the influence o f t he d eposition method (reactive sputtering and plasma enhanced atomic layer deposition) and film thickness (from 66 nm to 303 nm) on the AlN’s dielectric function.
© 2021 The Author(s)
PDF ArticleMore Like This
J. Kohout, T. Schmitt, R. Vernhes, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu
WA.6 Optical Interference Coatings (OIC) 2016
Yanhua Sha, Jiaye Wu, Jie Chen, Shengdong Zhang, and Qian Li
JW7A.30 Frontiers in Optics (FiO) 2021
S. Bruynooghe, N. Schmidt, M. Sundermann, H.W. Becker, and S. Spinzig
ThA9 Optical Interference Coatings (OIC) 2010