Abstract
The growth of organic thin film, 2-methyl-4-nitroaniline (MNA), by organic molecular beam deposition (OMBD) on a silicon substrate was studied from the mono-to multiple-layer regime with spectroscopic ellipsometry (SE), atomic force microscopy (AFM), and x-ray photoelectron spectroscopy (XPS). The aim of the present work has been to study and understand the microscopic conditions under which growth of molecular thin films can be prepared and analyzed.
© 2001 Optical Society of America
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