Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

M. Perske; H. Pauer; S. Yulin; V. Nesterenko; M. Schürmann; T. Feigl; N. Kaiser

doi:10.1364/OIC.2010.MD3

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MD3
•https://doi.org/10.1364/OIC.2010.MD3

Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser, "Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MD3.

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Abstract

The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world’s largest EUV collector are presented.

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