Abstract
We demonstrate the fabrication of small core high index contrast Polysiloxane waveguides using Ultraviolet Nanoimprint Lithography for the first time, and report zero process induced excess loss at 1550nm in the finished devices. This technique was also explored for the single step fabrication of more complex devices, e.g., grating waveguide and 3dB couplers.
© 2009 Optical Society of America
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