Abstract
The effect of polarization changes through an immersion lithographic projection lens on image critical dimension is examined. Ignoring these polarization changes in imaging models produces errors in prediction of across-field behavior and lens tolerance analysis.
© 2006 Optical Society of America
PDF ArticleMore Like This
Bruce W. Smith, Anatoly Bourov, Jainming Zhou, Lena Zavyalova, Neal Lafferty, Yongfa Fan, Frank Cropanese, and Andrew Estroff
OMA2 Optical Fabrication and Testing (OF&T) 2004
John H. Burnett
OFTuC1 Optical Fabrication and Testing (OF&T) 2006
Hamid Reza Fallah and Ayatollah Karimzadeh
ME17 International Optical Design Conference (IODC) 2006