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Conferences > EUVXRAY > 2024 > ETh2A > ETh2A.3

Accelerator development plan in KEK toward realization of High-power EUV-FEL for future lithography

Hiroshi Kawata, Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Miho Shimada, Takanori Tanikawa, Olga A. Tanaka, Takashi Obina, and Shinichiro Michizono

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Abstract

The development of a high-power EUV light source is important to overcome the stochastic effects in future lithography. The EUV-FEL light source is one of the promising candidates. This paper proposes the accelerator development plan.

© 2024 The Author(s)

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