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Conferences > CLEO_SI > 2023 > SW4L > SW4L.6

Wafer-level fabrication of Fabry-Pérot resonators with finesse exceeding one million

Naijun Jin, Yifan Liu, Charles A. McLemore, Yizhi Luo, David Mason, Prashanta Kharel, Scott A. Diddams, Franklyn Quinlan, and Peter Rakich

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Abstract

We demonstrate a wafer-level fabrication technique for high-finesse Fabry-Pérot optical resonators based on reflow and optical contact bonding. These resonators have finesse exceeding one million at 1550 nm and can be readily used as reference cavities.

© 2023 The Author(s)

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