Abstract
A terahertz (THz) wire-grid polarizer consisting of a micrometer-pitch Al grating on a Si substrate was fabricated by photolithography and wet etching. Extinction ratio (the ratio of TM and TE transmittances) was over 35 dB at 0.5 THz, and over 23 dB in the 0.5–3 THz range. At the Brewster’s angle of Si (74°), TM transmission exceeded 90% in the 0.5–3 THz range. The fabricated polarizer had a higher extinction ratio than conventional free-standing terahertz wire-grid polarizers.
© 2015 IEEE
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